The objective of this subject is to understand the nature of manufacturing process variation and the methods for its control. First, a general process model for control is developed to understand the limitations a specific process places on the type of control used. A general model for process variation is presented and three methods are developed to minimize variations: Statistical Process Control, Process Optimization and in-process Feedback Control. These are considered in a hierarchy of cost-performance tradeoffs, where performance is based on changes in process capability.
Principles of thermal radiation and their application to engineering heat and photon transfer problems. Quantum and classical models of radiative properties of materials, electromagnetic wave theory for thermal radiation, radiative transfer in absorbing, emitting, and scattering media, and coherent laser radiation. Applications cover laser-material interactions, imaging, infrared instrumentation, global warming, semiconductor manufacturing, combustion, furnaces, and high temperature processing.
6.780 covers statistical modeling and the control of semiconductor fabrication processes and plants. Topics include design of experiments, response surface modeling, and process optimization; defect and parametric yield modeling; process/device/circuit yield optimization; monitoring, diagnosis, and feedback control of equipment and processes; analysis and scheduling of semiconductor manufacturing operations.
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